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Femtosecond Laser Precision Engineering: From Micron, Submicron, to Nanoscale
- Ultrafast Science Vol. 1, Issue 3, (2021)
- Affiliations：
a Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3,Singapore
- Author bio：
- Funds：Academic Research Fund Tier 2, Ministry of Education - Singapore (MOE2019-T2-2-147).
DOI：10.34133/2021/9783514
CLC：Published：2021，
- Accepted：
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Zhenyuan Lin, Minghui Hong. 2021: Femtosecond Laser Precision Engineering: From Micron, Submicron, to Nanoscale. 超快科学, 2021(3).
Zhenyuan Lin，Minghui Hong, . 2021: Femtosecond Laser Precision Engineering: From Micron, Submicron, to Nanoscale. Ultrafast Science, 2021(3).
Zhenyuan Lin, Minghui Hong. 2021: Femtosecond Laser Precision Engineering: From Micron, Submicron, to Nanoscale. 超快科学, 2021(3). DOI： 10.34133/2021/9783514
Zhenyuan Lin，Minghui Hong, . 2021: Femtosecond Laser Precision Engineering: From Micron, Submicron, to Nanoscale. Ultrafast Science, 2021(3). DOI： 10.34133/2021/9783514
摘要
As a noncontact strategy with flexible tools and high efficiency
laser precision engineering is a significant advanced processing way for high-quality micro-/nanostructure fabrication
especially to achieve novel functional photoelectric structures and devices. For the microscale creation
several femtosecond laser fabrication methods
including multiphoton absorption
laser-induced plasma-assisted ablation
and incubation effect have been developed. Meanwhile
the femtosecond laser can be combined with microlens arrays and interference lithography techniques to achieve the structures in submicron scales. Down to nanoscale feature sizes
advanced processing strategies
such as near-field scanning optical microscope
atomic force microscope
and microsphere
are applied in femtosecond laser processing and the minimum nanostructure creation has been pushed down to ~25 nm due to near-field effect. The most fascinating femtosecond laser precision engineering is the possibility of large-area
high-throughput
and far-field nanofabrication. In combination with special strategies
including dual femtosecond laser beam irradiation
~15 nm nanostructuring can be achieved directly on silicon surfaces in far field and in ambient air. The challenges and perspectives in the femtosecond laser precision engineering are also discussed.
Abstract
As a noncontact strategy with flexible tools and high efficiency
laser precision engineering is a significant advanced processing way for high-quality micro-/nanostructure fabrication
especially to achieve novel functional photoelectric structures and devices. For the microscale creation
several femtosecond laser fabrication methods
including multiphoton absorption
laser-induced plasma-assisted ablation
and incubation effect have been developed. Meanwhile
the femtosecond laser can be combined with microlens arrays and interference lithography techniques to achieve the structures in submicron scales. Down to nanoscale feature sizes
advanced processing strategies
such as near-field scanning optical microscope
atomic force microscope
and microsphere
are applied in femtosecond laser processing and the minimum nanostructure creation has been pushed down to ~25 nm due to near-field effect. The most fascinating femtosecond laser precision engineering is the possibility of large-area
high-throughput
and far-field nanofabrication. In combination with special strategies
including dual femtosecond laser beam irradiation
~15 nm nanostructuring can be achieved directly on silicon surfaces in far field and in ambient air. The challenges and perspectives in the femtosecond laser precision engineering are also discussed.
关键词
Keywords
references
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