Femtosecond laser ablation-driven periodic surface structuring offers a promising method for large-scale and high-throughput nanolithography technique. However

the self-organized periodic structures typically manifest constraints in terms of tunable period and depth

as well as suboptimal regularity

which restricts their broader application potential. Here

in terms of a rarely explored laser-induced photochemical mechanism for nonablative structuring

we demonstrate manufacturing of sub-wavelength oxidative grating structures on silicon films with active structural modulation. In this scenario

the plasmonic field plays a pivotal role in dragging oxygen ions from surface into the silicon

greatly speeding up oxidation rates. While high oxygen doping levels can already be achieved with single-pulse exposure

far superior results are obtained with the application of 40-MHz burst mode pulse trains

mitigating the formation of excessively large nanocrystallites. Furthermore

it is revealed that the periodicity and modulation depth of laser-writing nanograting are both dependent on the number of pulse per burst. This offers a convenient scheme for actively controlling laser plasmonic lithography.